Publication:

Advanced cleaning and ultra-thin oxide technology

Date

1998
Presentation
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dc.contributor.authorHeyns, Marc
dc.contributor.authorCornelissen, Ingrid
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorDegraeve, Robin
dc.contributor.authorKnotter, D. M.
dc.contributor.authorMertens, Paul
dc.contributor.authorMertens, S.
dc.contributor.authorMeuris, Marc
dc.contributor.authorNigam, Tanya
dc.contributor.authorRotondaro, Antonio
dc.contributor.authorSchaekers, Marc
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorVos, Rita
dc.contributor.authorWolke, K.
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorCornelissen, Ingrid
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorVos, Rita
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-09-30T12:11:58Z
dc.date.available2021-09-30T12:11:58Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2634
dc.source.conferenceSCP Symposium; 23-24 April 1998; Boise, ID, USA.
dc.source.conferencelocation
dc.title

Advanced cleaning and ultra-thin oxide technology

dc.typeOral presentation
dspace.entity.typePublication
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