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On a more accurate assessment of scaled copper/low-k interconnects performance

Date

2007-08
Journal article
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dc.contributor.authorTravaly, Youssef
dc.contributor.authorBamal, Mandeep
dc.contributor.authorCarbonell, Laure
dc.contributor.authorTokei, Zsolt
dc.contributor.authorVan Olmen, Jan
dc.contributor.authorIacopi, Francesca
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorStucchi, Michele
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorVan Olmen, Jan
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorMaex, Karen
dc.date.accessioned2021-10-16T20:15:18Z
dc.date.available2021-10-16T20:15:18Z
dc.date.issued2007-08
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12988
dc.source.beginpage333
dc.source.endpage340
dc.source.issue3
dc.source.journalIEEE Trans. Semiconductor Manufacturing
dc.source.volume20
dc.title

On a more accurate assessment of scaled copper/low-k interconnects performance

dc.typeJournal article
dspace.entity.typePublication
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