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Conference contributions
Line edge roughness (LER) correlation and dielectric reliability with spacer-defined double patterning (SDDP) at 20nm half pitch
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Line edge roughness (LER) correlation and dielectric reliability with spacer-defined double patterning (SDDP) at 20nm half pitch
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Date
2011
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Siew, Yong Kong
;
Stucchi, Michele
;
Versluijs, Janko
;
Roussel, Philippe
;
Kunnen, Eddy
;
Pantouvaki, Marianna
;
Beyer, Gerald
;
Tokei, Zsolt
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1800
since deposited on 2021-10-19
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last month
Acq. date: 2025-12-16
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Metrics
Views
1800
since deposited on 2021-10-19
2
last month
Acq. date: 2025-12-16
Citations