Publication:
Recent advances in EUV patterning in preparation towards high-NA EUV
| dc.contributor.author | Nagahara, Seiji | |
| dc.contributor.author | Dauendorffer, Arnaud | |
| dc.contributor.author | Thiam, Arame | |
| dc.contributor.author | Liu, Xiang | |
| dc.contributor.author | Kuwahara, Yuhei | |
| dc.contributor.author | Dinh, Cong Que | |
| dc.contributor.author | Okada, Soichiro | |
| dc.contributor.author | Kawakami, Shinichiro | |
| dc.contributor.author | Genjima, Hisashi | |
| dc.contributor.author | Nagamine, Noriaki | |
| dc.contributor.author | Muramatsu, Makoto | |
| dc.contributor.author | Shimura, Satoru | |
| dc.contributor.author | Tsuboi, Atsushi | |
| dc.contributor.author | Nafus, Kathleen | |
| dc.contributor.author | Feurprier, Yannick | |
| dc.contributor.author | Demand, Marc | |
| dc.contributor.author | Ramaneti, Rajesh | |
| dc.contributor.author | Foubert, Philippe | |
| dc.contributor.author | De Simone, Danilo | |
| dc.contributor.author | Vandenberghe, Geert | |
| dc.contributor.imecauthor | Dauendorffer, Arnaud | |
| dc.contributor.imecauthor | Thiam, Arame | |
| dc.contributor.imecauthor | Liu, Xiang | |
| dc.contributor.imecauthor | Okada, Soichiro | |
| dc.contributor.imecauthor | Genjima, Hisashi | |
| dc.contributor.imecauthor | Nagamine, Noriaki | |
| dc.contributor.imecauthor | Nafus, Kathleen | |
| dc.contributor.imecauthor | Feurprier, Yannick | |
| dc.contributor.imecauthor | Demand, Marc | |
| dc.contributor.imecauthor | Ramaneti, Rajesh | |
| dc.contributor.imecauthor | Foubert, Philippe | |
| dc.contributor.imecauthor | De Simone, Danilo | |
| dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
| dc.date.accessioned | 2024-04-15T08:53:30Z | |
| dc.date.available | 2023-07-28T17:39:47Z | |
| dc.date.available | 2024-04-15T08:53:30Z | |
| dc.date.issued | 2023 | |
| dc.identifier.doi | 10.1117/12.2657432 | |
| dc.identifier.eisbn | 978-1-5106-6104-2 | |
| dc.identifier.isbn | 978-1-5106-6103-5 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/42227 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | Art. 124981G | |
| dc.source.conference | Conference on Advances in Patterning Materials and Processes XL | |
| dc.source.conferencedate | FEB 27-MAR 01, 2023 | |
| dc.source.conferencelocation | San Jose | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 10 | |
| dc.title | Recent advances in EUV patterning in preparation towards high-NA EUV | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |