Publication:

Recent advances in EUV patterning in preparation towards high-NA EUV

Date

2023
Proceedings Paper
https://doi.org/10.1117/12.2657432
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dc.contributor.authorNagahara, Seiji
dc.contributor.authorDauendorffer, Arnaud
dc.contributor.authorThiam, Arame
dc.contributor.authorLiu, Xiang
dc.contributor.authorKuwahara, Yuhei
dc.contributor.authorDinh, Cong Que
dc.contributor.authorOkada, Soichiro
dc.contributor.authorKawakami, Shinichiro
dc.contributor.authorGenjima, Hisashi
dc.contributor.authorNagamine, Noriaki
dc.contributor.authorMuramatsu, Makoto
dc.contributor.authorShimura, Satoru
dc.contributor.authorTsuboi, Atsushi
dc.contributor.authorNafus, Kathleen
dc.contributor.authorFeurprier, Yannick
dc.contributor.authorDemand, Marc
dc.contributor.authorRamaneti, Rajesh
dc.contributor.authorFoubert, Philippe
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVandenberghe, Geert
dc.contributor.imecauthorDauendorffer, Arnaud
dc.contributor.imecauthorThiam, Arame
dc.contributor.imecauthorLiu, Xiang
dc.contributor.imecauthorOkada, Soichiro
dc.contributor.imecauthorGenjima, Hisashi
dc.contributor.imecauthorNagamine, Noriaki
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorFeurprier, Yannick
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorRamaneti, Rajesh
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned2024-04-15T08:53:30Z
dc.date.available2023-07-28T17:39:47Z
dc.date.available2024-04-15T08:53:30Z
dc.date.issued2023
dc.identifier.doi10.1117/12.2657432
dc.identifier.eisbn978-1-5106-6104-2
dc.identifier.isbn978-1-5106-6103-5
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42227
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpageArt. 124981G
dc.source.conferenceConference on Advances in Patterning Materials and Processes XL
dc.source.conferencedateFEB 27-MAR 01, 2023
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.numberofpages10
dc.title

Recent advances in EUV patterning in preparation towards high-NA EUV

dc.typeProceedings paper
dspace.entity.typePublication
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