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Enhancement of ALCVD(TM) TiN growth on Si-O-C and a-SiC:H films by O2-based plasma treatments
Publication:
Enhancement of ALCVD(TM) TiN growth on Si-O-C and a-SiC:H films by O2-based plasma treatments
Date
2002
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Satta, Alessandra
;
Baklanov, Mikhaïl
;
Richard, Olivier
;
Vantomme, Andre
;
Bender, Hugo
;
Conard, Thierry
;
Maex, Karen
;
Li, W.M.
;
Elers, K. E.
;
Haukka, S.
Journal
Microelectronic Engineering
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1874
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations
Metrics
Views
1874
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations