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Epitaxial chemical vapor deposition of silicon on an oxygen monolayer on Si(100) substrates

Date

2013-09
Journal article
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dc.contributor.authorDelabie, Annelies
dc.contributor.authorJayachandran, Suseendran
dc.contributor.authorCaymax, Matty
dc.contributor.authorLoo, Roger
dc.contributor.authorMaggen, Jens
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorDouhard, Bastien
dc.contributor.authorConard, Thierry
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorLenka, Hara
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorJayachandran, Suseendran
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.date.accessioned2021-10-21T07:16:12Z
dc.date.available2021-10-21T07:16:12Z
dc.date.issued2013-09
dc.identifier.issn2162-8726
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22248
dc.source.beginpageP104
dc.source.endpageP106
dc.source.issue11
dc.source.journalECS Solid State Letters
dc.source.volume2
dc.title

Epitaxial chemical vapor deposition of silicon on an oxygen monolayer on Si(100) substrates

dc.typeJournal article
dspace.entity.typePublication
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