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Articles
Lithography options for the 32nm half pitch node and beyond
Publication:
Lithography options for the 32nm half pitch node and beyond
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Date
2009
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19205.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ronse, Kurt
;
Jansen, Philippe
;
Gronheid, Roel
;
Hendrickx, Eric
;
Maenhoudt, Mireille
;
Wiaux, Vincent
;
Goethals, Mieke
;
Jonckheere, Rik
;
Vandenberghe, Geert
Journal
IEEE Transactions on Circuits and Systems I: Regular Papers
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1876
since deposited on 2021-10-18
Acq. date: 2025-12-15
Citations
Metrics
Views
1876
since deposited on 2021-10-18
Acq. date: 2025-12-15
Citations