Publication:

Lithography options for the 32nm half pitch node and beyond

Date

2009
Journal article
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dc.contributor.authorRonse, Kurt
dc.contributor.authorJansen, Philippe
dc.contributor.authorGronheid, Roel
dc.contributor.authorHendrickx, Eric
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorWiaux, Vincent
dc.contributor.authorGoethals, Mieke
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.accessioned2021-10-18T02:27:51Z
dc.date.available2021-10-18T02:27:51Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16136
dc.source.beginpage1884
dc.source.endpage1891
dc.source.issue8
dc.source.journalIEEE Transactions on Circuits and Systems I: Regular Papers
dc.source.volume56
dc.title

Lithography options for the 32nm half pitch node and beyond

dc.typeJournal article
dspace.entity.typePublication
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