Publication:

Temperature influence on analog parameters of vertical nanowire transistors

 
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0001-5490-0416
cris.virtual.orcid#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtualsource.department9f04b13f-f81c-4d48-a5bd-0b2cb5210392
cris.virtualsource.departmentbd265d49-9bfb-424d-adea-35c86526f50d
cris.virtualsource.orcid9f04b13f-f81c-4d48-a5bd-0b2cb5210392
cris.virtualsource.orcidbd265d49-9bfb-424d-adea-35c86526f50d
dc.contributor.authorSilva, V. C. P.
dc.contributor.authorRibeiro, A. R.
dc.contributor.authorMartino, J. A.
dc.contributor.authorVeloso, Anabela
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorAgopian, P. G. D.
dc.date.accessioned2026-06-15T12:50:44Z
dc.date.available2026-06-15T12:50:44Z
dc.date.createdwos2026-02-25
dc.date.issued2025
dc.description.abstractThis study investigates the impact of high temperatures on DC analog parameters of vertical nanowire pMOSFET (V-pFET). Measurements were performed at three temperatures (25 °C, 100 °C and 150 °C), where the main electrical parameters were analyzed. The results indicated an unexpected increase in the drain current and transconductance (gm) over the entire gate voltage range as temperature increased. This behavior is attributed to the competition of different effects such as the strong threshold voltage reduction and mobility degradation caused by the vertical electric field and the influence of high access resistance, which modifies the potential drop across the channel and alters the electric field distribution. On the other hand, the subthreshold slope (SS) exhibited the expected temperature dependence. However, when the temperature increases, the output conductance showed a slight variation. The Early voltage (VEA) increased with temperature, indicating a reduction in the Early effect. Despite this variation, the intrinsic voltage gain remained remarkably stable when expressed in decibels—approximately 34–36 dB for the device with 400 nanowires—demonstrating good thermal robustness of analog performance.
dc.description.wosFundingTextThe Brazilian authors acknowledge CNPq, CAPES (Finance Code 001) and FAPESP (2020/04867-2) for the financial support. We also thanks imec CMOS technology program members and the amsimec test labs for their support.
dc.identifier.doi10.1016/j.sse.2025.109206
dc.identifier.issn0038-1101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/59701
dc.language.isoeng
dc.provenance.editstepusergreet.vanhoof@imec.be
dc.publisherPERGAMON-ELSEVIER SCIENCE LTD
dc.source.beginpage109206
dc.source.journalSOLID-STATE ELECTRONICS
dc.source.numberofpages5
dc.source.volume229
dc.title

Temperature influence on analog parameters of vertical nanowire transistors

dc.typeJournal article
dspace.entity.typePublication
imec.internal.crawledAt2026-04-07
imec.internal.sourcecrawler
imec.internal.wosCreatedAt2026-04-07
Files
Publication available in collections: