Publication:
Multi-VT Options at Scaled Vertical Pitch in Gate-All-Around Nanosheet Devices by Independent Inner-Outer Work-function Tuning
| dc.contributor.author | Gaddemane, Gautam | |
| dc.contributor.author | Bhuwalka, Krishna | |
| dc.contributor.author | Rzepa, Gerhard | |
| dc.contributor.author | Schuddinck, Pieter | |
| dc.contributor.author | Arimura, Hiroaki | |
| dc.contributor.author | Matagne, Philippe | |
| dc.contributor.author | Wu, Hao | |
| dc.contributor.author | Horiguchi, Naoto | |
| dc.contributor.author | Hellings, Geert | |
| dc.contributor.author | Liu, Changze | |
| dc.contributor.imecauthor | Gaddemane, Gautam | |
| dc.contributor.imecauthor | Schuddinck, Pieter | |
| dc.contributor.imecauthor | Arimura, Hiroaki | |
| dc.contributor.imecauthor | Matagne, Philippe | |
| dc.contributor.imecauthor | Horiguchi, Naoto | |
| dc.contributor.imecauthor | Hellings, Geert | |
| dc.contributor.orcidimec | Gaddemane, Gautam::0000-0003-0067-8674 | |
| dc.contributor.orcidimec | Schuddinck, Pieter::0000-0003-1893-3135 | |
| dc.contributor.orcidimec | Arimura, Hiroaki::0000-0002-3138-708X | |
| dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
| dc.contributor.orcidimec | Hellings, Geert::0000-0002-5376-2119 | |
| dc.contributor.orcidimec | Matagne, Philippe::0000-0003-0365-2066 | |
| dc.date.accessioned | 2025-06-17T12:00:20Z | |
| dc.date.available | 2024-09-14T17:21:08Z | |
| dc.date.available | 2025-06-17T12:00:20Z | |
| dc.date.issued | 2024 | |
| dc.identifier.doi | 10.1109/EDTM58488.2024.10512044 | |
| dc.identifier.eisbn | 979-8-3503-7152-9 | |
| dc.identifier.isbn | 979-8-3503-8308-9 | |
| dc.identifier.issn | N/A | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/44485 | |
| dc.publisher | IEEE | |
| dc.source.beginpage | 445 | |
| dc.source.conference | 8th Electron Devices Technology & Manufacturing Conference (EDTM) | |
| dc.source.conferencedate | MAR 03-06, 2024 | |
| dc.source.conferencelocation | Bangalore | |
| dc.source.endpage | 447 | |
| dc.source.journal | N/A | |
| dc.source.numberofpages | 3 | |
| dc.title | Multi-VT Options at Scaled Vertical Pitch in Gate-All-Around Nanosheet Devices by Independent Inner-Outer Work-function Tuning | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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