Publication:

Phase-shift photomask designed by scalar diffractiontheory

Date

2009-09
Proceedings Paper
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dc.contributor.authorCirino, Giuseppe
dc.contributor.authorMansano, Ronaldo
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorCescato, Lucila
dc.contributor.authorMarega, E.
dc.contributor.authorGoncalves Neto, Luiz
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.date.accessioned2021-10-17T21:35:56Z
dc.date.available2021-10-17T21:35:56Z
dc.date.issued2009-09
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15100
dc.source.beginpage487
dc.source.conference24th Symposium on Microelectronics Technology and Devices - SBMicro
dc.source.conferencedate31/08/2009
dc.source.conferencelocationNatal Brazil
dc.source.endpage497
dc.title

Phase-shift photomask designed by scalar diffractiontheory

dc.typeProceedings paper
dspace.entity.typePublication
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