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Fundamental investigation of chemical mechanical polishing of GaAs in ailica dispersions: Material removal and arsenic trihydride formation pathways
Publication:
Fundamental investigation of chemical mechanical polishing of GaAs in ailica dispersions: Material removal and arsenic trihydride formation pathways
Date
2013
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ong, Patrick
;
Matovu, J.B.
;
Leunissen, Peter
;
Krishnan, Sitaraman
;
Babu, S.V.
Journal
ECS Journal of Solid State Science and Technology
Abstract
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Views
1966
since deposited on 2021-10-21
Acq. date: 2025-12-08
Citations
Metrics
Views
1966
since deposited on 2021-10-21
Acq. date: 2025-12-08
Citations