Publication:
Fundamental investigation of chemical mechanical polishing of GaAs in ailica dispersions: Material removal and arsenic trihydride formation pathways
Date
| dc.contributor.author | Ong, Patrick | |
| dc.contributor.author | Matovu, J.B. | |
| dc.contributor.author | Leunissen, Peter | |
| dc.contributor.author | Krishnan, Sitaraman | |
| dc.contributor.author | Babu, S.V. | |
| dc.contributor.imecauthor | Ong, Patrick | |
| dc.contributor.orcidimec | Ong, Patrick::0000-0002-2072-292X | |
| dc.date.accessioned | 2021-10-21T10:36:31Z | |
| dc.date.available | 2021-10-21T10:36:31Z | |
| dc.date.issued | 2013 | |
| dc.identifier.issn | 2162-8769 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/22886 | |
| dc.identifier.url | http://jss.ecsdl.org/content/2/11/P432 | |
| dc.source.beginpage | P432 | |
| dc.source.endpage | P439 | |
| dc.source.issue | 11 | |
| dc.source.journal | ECS Journal of Solid State Science and Technology | |
| dc.source.volume | 2 | |
| dc.title | Fundamental investigation of chemical mechanical polishing of GaAs in ailica dispersions: Material removal and arsenic trihydride formation pathways | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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