Publication:

A Ge matrix removal method for metallic contamination analysis on Ge wafers using TXRF

Date

2004
Presentation
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dc.contributor.authorHellin, David
dc.contributor.authorGeens, Veerle
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorRip, Jens
dc.contributor.authorTheuwis, Antoon
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorVinckier, Chris
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorRip, Jens
dc.contributor.imecauthorTheuwis, Antoon
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-15T13:45:59Z
dc.date.available2021-10-15T13:45:59Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9014
dc.source.conferenceEuropean Conference on X-Ray Spectrometry
dc.source.conferencedate6/06/2004
dc.source.conferencelocationAlghero Italy
dc.title

A Ge matrix removal method for metallic contamination analysis on Ge wafers using TXRF

dc.typeOral presentation
dspace.entity.typePublication
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