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Atomic-scale investigations on the wet etching kinetics of Ge versus SiGe in acidic H2O2 solutions: a post operando synchrotron XPS analysis
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2109 since deposited on 2021-10-28
Acq. date: 2026-02-26
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Views
2109 since deposited on 2021-10-28
Acq. date: 2026-02-26
Citations