Publication:
A new technique to fabricate ultra-shallow-junctions, combining in-situ vapour HCl etching and in-situ doped epitaxial SiGe re-growth
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2007 since deposited on 2021-10-15
Acq. date: 2025-10-23
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Views
2007 since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations