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Surface chemistry and Fermi level movement during the self-cleaning of GaAs by trimethyl-aluminum
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Surface chemistry and Fermi level movement during the self-cleaning of GaAs by trimethyl-aluminum
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Date
2011-07
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Tallarida, Massimo
;
Adelmann, Christoph
;
Delabie, Annelies
;
Van Elshocht, Sven
;
Caymax, Matty
;
Schmeisser, Dieter
Journal
Applied Physics Letters
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1913
since deposited on 2021-10-19
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Acq. date: 2025-12-11
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Views
1913
since deposited on 2021-10-19
2
last month
Acq. date: 2025-12-11
Citations