Surface chemistry and Fermi level movement during the self-cleaning of GaAs by trimethyl-aluminum

dc.contributor.author	Tallarida, Massimo
dc.contributor.author	Adelmann, Christoph
dc.contributor.author	Delabie, Annelies
dc.contributor.author	Van Elshocht, Sven
dc.contributor.author	Caymax, Matty
dc.contributor.author	Schmeisser, Dieter
dc.contributor.imecauthor	Adelmann, Christoph
dc.contributor.imecauthor	Delabie, Annelies
dc.contributor.imecauthor	Van Elshocht, Sven
dc.contributor.imecauthor	Caymax, Matty
dc.contributor.orcidimec	Adelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimec	Van Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned	2021-10-19T19:28:02Z
dc.date.available	2021-10-19T19:28:02Z
dc.date.issued	2011-07
dc.identifier.issn	0003-6951
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/19862
dc.identifier.url	http://apl.aip.org/resource/1/applab/v99/i4/p042906_s1
dc.source.beginpage	42906
dc.source.issue	4
dc.source.journal	Applied Physics Letters
dc.source.volume	99
dc.title	Surface chemistry and Fermi level movement during the self-cleaning of GaAs by trimethyl-aluminum
dc.type	Journal article
dspace.entity.type	Publication
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