Publication:

A snapshot review on metal-semiconductor contact exploration for 7-nm CMOS technology and beyond

Date

2022-11-21
Journal Article Review
https://doi.org/10.1557/s43580-022-00404-1
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dc.contributor.authorYu, Hao
dc.contributor.authorSchaekers, Marc
dc.contributor.authorEveraert, Jean-Luc
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorDe Meyer, Kristin
dc.contributor.authorCollaert, Nadine
dc.contributor.imecauthorYu, Hao
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorEveraert, Jean-Luc
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.orcidimecYu, Hao::0000-0002-1976-0259
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecEveraert, Jean-Luc::0000-0002-0660-9090
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.accessioned2023-04-20T10:09:05Z
dc.date.available2022-12-05T03:07:40Z
dc.date.available2022-12-16T12:18:20Z
dc.date.available2023-04-20T10:09:05Z
dc.date.embargo2023-12-31
dc.date.issued2022-11-21
dc.identifier.doi10.1557/s43580-022-00404-1
dc.identifier.issn2731-5894
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40828
dc.publisherSPRINGER HEIDELBERG
dc.source.beginpage1369
dc.source.endpage1379
dc.source.issue36
dc.source.journalMRS ADVANCES
dc.source.numberofpages11
dc.source.volume7
dc.subject.keywordsTRANSMISSION-LINE MODEL
dc.subject.keywordsGE PREAMORPHIZATION
dc.subject.keywordsBARRIER HEIGHTS
dc.subject.keywordsRESISTIVITY
dc.subject.keywordsSI
dc.subject.keywordsTI
dc.subject.keywordsRESISTANCE
dc.subject.keywordsIMPLANTATION
dc.subject.keywordsJUNCTIONS
dc.subject.keywordsSILICIDE
dc.title

A snapshot review on metal-semiconductor contact exploration for 7-nm CMOS technology and beyond

dc.typeJournal article review
dspace.entity.typePublication
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