Publication:
W versus Co–Al as gate fill-metal for aggressively scaled replacement high-k/metal gate devices for (Sub-)22nm technology nodes
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1998 since deposited on 2021-10-21
Acq. date: 2025-10-23
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Metrics
Views
1998 since deposited on 2021-10-21
Acq. date: 2025-10-23
Citations