Publication:

Replacement metal contact using sacrificial ILD0 for wrap around contact in scaled FinFET technology

Date

2018
Proceedings Paper
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dc.contributor.authorChew, Soon Aik
dc.contributor.authorDemuynck, Steven
dc.contributor.authorZhang, Liping
dc.contributor.authorPacco, Antoine
dc.contributor.authorDevriendt, Katia
dc.contributor.authorTeugels, Lieve
dc.contributor.authorHopf, Toby
dc.contributor.authorVersluijs, Janko
dc.contributor.authorVrancken, Christa
dc.contributor.authorDangol, Anish
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorMocuta, Dan
dc.contributor.authorHoriguchi, Naoto
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorZhang, Liping
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorDevriendt, Katia
dc.contributor.imecauthorTeugels, Lieve
dc.contributor.imecauthorHopf, Toby
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorDangol, Anish
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecDevriendt, Katia::0000-0002-0662-7926
dc.contributor.orcidimecTeugels, Lieve::0000-0002-6613-9414
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-25T17:13:13Z
dc.date.available2021-10-25T17:13:13Z
dc.date.embargo9999-12-31
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30409
dc.identifier.urlhttps://ieeexplore.ieee.org/document/8430457/
dc.source.beginpage33
dc.source.conferenceIEEE International Interconnect Technology Conference - IITC
dc.source.conferencedate4/06/2018
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage35
dc.title

Replacement metal contact using sacrificial ILD0 for wrap around contact in scaled FinFET technology

dc.typeProceedings paper
dspace.entity.typePublication
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