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Resistivity of ultra-narrow Cu interconnects fabricated with ion beam lithography
Publication:
Resistivity of ultra-narrow Cu interconnects fabricated with ion beam lithography
Date
2003
Proceedings Paper
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Wu, Wen
;
Jonckheere, Rik
;
Tokei, Zsolt
;
Stucchi, Michele
;
Struyf, Herbert
;
Vos, Ingrid
;
Bender, Hugo
;
Maex, Karen
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1978
since deposited on 2021-10-15
Acq. date: 2025-10-24
Citations
Metrics
Views
1978
since deposited on 2021-10-15
Acq. date: 2025-10-24
Citations