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Ni-FUSI on high-k as a candidate for 65nm LSTP CMOS

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dc.contributor.authorKubicek, Stefan
dc.contributor.authorVeloso, Anabela
dc.contributor.authorKottantharayil, Anil
dc.contributor.authorHayashi, Shigenori
dc.contributor.authorYamamoto, Kazuhiko
dc.contributor.authorMitsuhashi, Riichirou
dc.contributor.authorKittl, Jorge
dc.contributor.authorLauwers, Anne
dc.contributor.authorHorii, S.
dc.contributor.authorHarada, Y.
dc.contributor.authorKubota, M.
dc.contributor.authorNiwa, Masaaki
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorJurczak, Gosia
dc.contributor.authorBiesemans, Serge
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-16T02:40:39Z
dc.date.available2021-10-16T02:40:39Z
dc.date.issued2005-04
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10727
dc.source.beginpage99
dc.source.conferenceProceedings IEEE VLSI-TSA International Symposium on VLSI Technology
dc.source.conferencedate25/04/2005
dc.source.conferencelocationHsinchu Taiwan
dc.source.endpage100
dc.title

Ni-FUSI on high-k as a candidate for 65nm LSTP CMOS

dc.typeProceedings paper
dspace.entity.typePublication
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