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Impact of Al2O3 position on performances and reliability in high-k metal gated DRAM periphery transistors
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Impact of Al2O3 position on performances and reliability in high-k metal gated DRAM periphery transistors
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Date
2013
Proceedings Paper
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Aoulaiche, Marc
;
Federico, Antonio
;
Simoen, Eddy
;
Ritzenthaler, Romain
;
Schram, Tom
;
Arimura, Hiroaki
;
Cho, Moon Ju
;
Kauerauf, Thomas
;
Crupi, Felice
;
Spessot, Alessio
;
Caillat, Christian
;
Fazan, Pierre
;
Na, Hoon Joo
;
Son, Yunik
;
Noh, Kyung Bong
;
Groeseneken, Guido
;
Horiguchi, Naoto
;
Thean, Aaron
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2025
since deposited on 2021-10-21
3
last month
Acq. date: 2025-12-10
Citations