Publication:

Surface Chemistry and Nanoscale Wet Etching of Group IV Semiconductors in Acidic H2O2 Solutions

Date

2021-02
Proceedings Paper
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dc.contributor.authorlebedev, Mikhail
dc.contributor.authorMayer, Thomas
dc.contributor.authorvan Dorp, Dennis
dc.contributor.authorAbrenica, Graniel
dc.contributor.authorArnauts, Sophia
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorvan Dorp, Dennis
dc.contributor.imecauthorAbrenica, Graniel
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecvan Dorp, Dennis::0000-0002-1085-4232
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecAltamirano Sanchez, Efrain::0000-0003-3235-6055
dc.date.accessioned2022-06-24T09:48:15Z
dc.date.available2021-11-30T17:04:50Z
dc.date.available2022-06-24T09:48:15Z
dc.date.issued2021-02
dc.identifier.issnna
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38503
dc.source.conferenceUCPSS
dc.source.conferencedatena
dc.source.conferencelocationOnline
dc.source.journalSolid State Phenomena
dc.source.numberofpages4
dc.subject.disciplineMaterials science
dc.title

Surface Chemistry and Nanoscale Wet Etching of Group IV Semiconductors in Acidic H2O2 Solutions

dc.typeProceedings paper
dspace.entity.typePublication
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