Publication:
Dry etching fin process for SOI finFET manufacturing: Transition from 32 to 22 nm 3 node on a 6T-SRAM cell
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2013 since deposited on 2021-10-19
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Acq. date: 2026-07-18
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Views
2013 since deposited on 2021-10-19
1last month
1last week
Acq. date: 2026-07-18
Citations