Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Conference contributions
Particle adhesion and removal mechanisms during brush scrubber cleaning in post-CMP processes
Publication:
Particle adhesion and removal mechanisms during brush scrubber cleaning in post-CMP processes
Date
2004
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Xu, Kaidong
;
Vos, Rita
;
Vereecke, Guy
;
Fyen, Wim
;
Holsteyns, Frank
;
Doumen, Geert
;
Mertens, Paul
;
Heyns, Marc
;
Vinckier, Chris
;
Fransaer, J.
Journal
Abstract
Description
Metrics
Views
1915
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations
Metrics
Views
1915
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations