Publication:

Area-selective Ru ALD by amorphous carbon modification using H plasma: from atomistic modeling to full wafer process integration

Date

2020
Journal article
https://doi.org/10.1039/d0ma00462f
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Published version 3.75 MB

Author(s)

Zyulkov, Ivan  
;
Voronina, Ekaterina
;
Krishtab, Mikhail  
;
Voloshin, Dmitry
;
Chan, BT  
;
Mankelevich, Yuri
;
Rakhimova, Tatyana
;
Armini, Silvia  
;
De Gendt, Stefan  

Journal

MATERIALS ADVANCES

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293 since deposited on 2021-11-02
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