Publication:
Area-selective Ru ALD by amorphous carbon modification using H plasma: from atomistic modeling to full wafer process integration
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Acq. date: 2026-04-07
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1940 since deposited on 2021-11-02
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341 since deposited on 2021-11-02
33last month
11last week
Acq. date: 2026-04-07
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1940 since deposited on 2021-11-02
Acq. date: 2026-04-07
Citations