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Fabrication of porogen residue free ultra low-k PECVD material by subsequent H2-afterglow plasma treatment and UV curing
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1942 since deposited on 2021-10-18
2last month
Acq. date: 2025-12-08
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Metrics
Views
1942 since deposited on 2021-10-18
2last month
Acq. date: 2025-12-08
Citations