Publication:

Effect of postdeposition anneal conditions on defect density of HfO2 layers measured by wet etching

Date

2004
Journal article
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Author(s)

Claes, Martine  
;
De Gendt, Stefan  
;
Witters, Thomas  
;
Kaushik, Vidya
;
Conard, Thierry  
;
Zhao, Chao
;
Manabe, Y.
;
Delabie, Annelies  
;
Röhr, Erika
;
Chen, Jerry
;
Tsai, Wilman
;
Heyns, Marc  

Journal

Journal of the Electrochemical Society

Abstract

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1963 since deposited on 2021-10-15
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