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Double patternig scheme for sub-0.25 k1 single damascene structures at NA=0.75, l=193nm

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dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorVersluijs, Janko
dc.contributor.authorStruyf, Herbert
dc.contributor.authorVan Olmen, Jan
dc.contributor.authorVan Hove, Marleen
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorVan Olmen, Jan
dc.date.accessioned2021-10-16T03:08:19Z
dc.date.available2021-10-16T03:08:19Z
dc.date.embargo9999-12-31
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10821
dc.source.beginpage1508
dc.source.conferenceOptical Microlithography XVIII
dc.source.conferencedate12/02/2005
dc.source.conferencelocationSan Diego, CA USA
dc.source.endpage1518
dc.title

Double patternig scheme for sub-0.25 k1 single damascene structures at NA=0.75, l=193nm

dc.typeProceedings paper
dspace.entity.typePublication
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