Publication:

Impact of sub-melt laser annealing on Si1-xGex source/drain defectivity

Date

2007
Proceedings Paper
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dc.contributor.authorRosseel, Erik
dc.contributor.authorLu, J.P
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorVerheyen, Peter
dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.authorRichard, Olivier
dc.contributor.authorGeypen, Jef
dc.contributor.authorBender, Hugo
dc.contributor.authorLoo, Roger
dc.contributor.authorAbsil, Philippe
dc.contributor.authorMc Intosh, R.
dc.contributor.authorFelch, S.
dc.contributor.authorSchreutelkamp, Rob
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorGeypen, Jef
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-16T19:11:06Z
dc.date.available2021-10-16T19:11:06Z
dc.date.embargo9999-12-31
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12806
dc.source.beginpage307
dc.source.conference15th IEEE Conference on Advanced Thermal Processing of Semiconductors - RTP
dc.source.conferencedate2/10/2007
dc.source.conferencelocationCatania Italy
dc.source.endpage315
dc.title

Impact of sub-melt laser annealing on Si1-xGex source/drain defectivity

dc.typeProceedings paper
dspace.entity.typePublication
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