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Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
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Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
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Date
2015
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Popovici, Mihaela Ioana
;
Redolfi, Augusto
;
Aoulaiche, Marc
;
van den Berg, J.A.
;
Douhard, Bastien
;
Swerts, Johan
;
Bailey, P.
;
Kaczer, Ben
;
Groven, Benjamin
;
Meersschaut, Johan
;
Conard, Thierry
;
Moussa, Alain
;
Adelmann, Christoph
;
Delabie, Annelies
;
Fazan, Pierre
;
Van Elshocht, Sven
;
Jurczak, Gosia
Journal
Microelectronic Engineering
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1917
since deposited on 2021-10-22
Acq. date: 2025-12-10
Citations
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Views
1917
since deposited on 2021-10-22
Acq. date: 2025-12-10
Citations