Publication:

Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition

Date

2015
Journal article
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dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorRedolfi, Augusto
dc.contributor.authorAoulaiche, Marc
dc.contributor.authorvan den Berg, J.A.
dc.contributor.authorDouhard, Bastien
dc.contributor.authorSwerts, Johan
dc.contributor.authorBailey, P.
dc.contributor.authorKaczer, Ben
dc.contributor.authorGroven, Benjamin
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorConard, Thierry
dc.contributor.authorMoussa, Alain
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorDelabie, Annelies
dc.contributor.authorFazan, Pierre
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorJurczak, Gosia
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorRedolfi, Augusto
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorGroven, Benjamin
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorFazan, Pierre
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecGroven, Benjamin::0000-0002-5781-7594
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-22T21:54:39Z
dc.date.available2021-10-22T21:54:39Z
dc.date.issued2015
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25771
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S0167931715003019
dc.source.beginpage108
dc.source.endpage112
dc.source.journalMicroelectronic Engineering
dc.source.volume147
dc.title

Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition

dc.typeJournal article
dspace.entity.typePublication
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