Publication:

Exploration of BEOL line-space patterning options at 12nm half-pitch and below

Date

2018
Proceedings Paper
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dc.contributor.authorDecoster, Stefan
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorPetersen Barbosa Lima, Lucas
dc.contributor.authorLi, Waikin
dc.contributor.authorVersluijs, Janko
dc.contributor.authorHalder, Sandip
dc.contributor.authorMallik, Arindam
dc.contributor.authorMurdoch, Gayle
dc.contributor.imecauthorDecoster, Stefan
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorPetersen Barbosa Lima, Lucas
dc.contributor.imecauthorLi, Waikin
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorMallik, Arindam
dc.contributor.imecauthorMurdoch, Gayle
dc.contributor.orcidimecDecoster, Stefan::0000-0003-1162-9288
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecMallik, Arindam::0000-0002-0742-9366
dc.date.accessioned2021-10-25T17:55:38Z
dc.date.available2021-10-25T17:55:38Z
dc.date.embargo9999-12-31
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30573
dc.identifier.urlhttps://doi.org/10.1117/12.2297183
dc.source.beginpage105890E
dc.source.conferenceAdvanced Etch Technology for Nanopatterning VII
dc.source.conferencedate25/02/2018
dc.source.conferencelocationSan Jose, CA USA
dc.title

Exploration of BEOL line-space patterning options at 12nm half-pitch and below

dc.typeProceedings paper
dspace.entity.typePublication
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