Publication:

Using Unsupervised Machine Learning for Plasma Etching Endpoint Detection

Date

2020
Proceedings Paper
https://doi.org/10.5220/0008877502730279
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Author(s)

Chakroun, Imen  
;
Ashby, Tom  
;
Das, Sayantan  
;
Halder, Sandip  
;
Wuyts, Roel  
;
Verachtert, Wilfried  

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na

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1495 since deposited on 2021-11-02
Acq. date: 2026-06-24

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1883 since deposited on 2021-11-02
Acq. date: 2026-06-24

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