Publication:

Using Unsupervised Machine Learning for Plasma Etching Endpoint Detection

Date

2020
Proceedings Paper
https://doi.org/10.5220/0008877502730279
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dc.contributor.authorChakroun, Imen
dc.contributor.authorAshby, Tom
dc.contributor.authorDas, Sayantan
dc.contributor.authorHalder, Sandip
dc.contributor.authorWuyts, Roel
dc.contributor.authorVerachtert, Wilfried
dc.contributor.imecauthorChakroun, Imen
dc.contributor.imecauthorAshby, Thomas J.
dc.contributor.imecauthorDas, Sayantan
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorWuyts, Roel
dc.contributor.imecauthorVerachtert, Wilfried
dc.contributor.imecauthorAshby, Tom
dc.contributor.orcidimecDas, Sayantan::0000-0002-3031-0726
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.date.accessioned2022-01-27T17:12:43Z
dc.date.available2021-11-02T16:05:16Z
dc.date.available2022-01-27T17:12:43Z
dc.date.issued2020
dc.identifier.doi10.5220/0008877502730279
dc.identifier.eisbn978-989-758-397-1
dc.identifier.issnna
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38204
dc.publisherSCITEPRESS
dc.source.beginpage273
dc.source.conference9th International Conference on Pattern Recognition Applications and Methods (ICPRAM)
dc.source.conferencedateFEB 22-24, 2020
dc.source.conferencelocationValletta
dc.source.endpage279
dc.source.journalna
dc.source.numberofpages7
dc.title

Using Unsupervised Machine Learning for Plasma Etching Endpoint Detection

dc.typeProceedings paper
dspace.entity.typePublication
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