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Advanced Ni-based FUlly SIlicidation (FUSI) technology for low-Vt CMOS devices
Publication:
Advanced Ni-based FUlly SIlicidation (FUSI) technology for low-Vt CMOS devices
Date
2007
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Yu, HongYu
;
Veloso, Anabela
;
Lauwers, Anne
;
Biesemans, Serge
Journal
Abstract
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1929
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
1929
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations