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Conference contributions
Gate double patterning strategies for 10nm node FinFET devices
Publication:
Gate double patterning strategies for 10nm node FinFET devices
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Date
2014
Meeting abstract
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27776.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hody, Hubert
;
Paraschiv, Vasile
;
Hellin, David
;
Vandeweyer, Tom
;
Boccardi, Guillaume
;
Xu, Kaidong
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1994
since deposited on 2021-10-22
Acq. date: 2025-12-16
Citations
Metrics
Views
1994
since deposited on 2021-10-22
Acq. date: 2025-12-16
Citations