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Influence of activation annealing and silicidation process on dopant redistribution and pile-up at the NixSiy/SiO2 interface
Publication:
Influence of activation annealing and silicidation process on dopant redistribution and pile-up at the NixSiy/SiO2 interface
Date
2005-05
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kmieciak, Malgorzata
;
Kittl, Jorge
;
Janssens, Tom
;
Lauwers, Anne
;
Vandervorst, Wilfried
;
Kottantharayil, Anil
;
Schram, Tom
;
Veloso, Anabela
;
Van Dal, Mark
;
Maex, Karen
;
Vantomme, Andre
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1905
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
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Views
1905
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations