Publication:
Predictive and prospective calibrated TCAD to improve device performances in sub-20 nm gate length p-FinFETs
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116 since deposited on 2024-04-05
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Acq. date: 2026-07-17
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Statistics
Views
116 since deposited on 2024-04-05
1last month
1last week
Acq. date: 2026-07-17
Citations