Publication:
Predictive and prospective calibrated TCAD to improve device performances in sub-20 nm gate length p-FinFETs
| dc.contributor.author | Eyben, Pierre | |
| dc.contributor.author | De Keersgieter, An | |
| dc.contributor.author | Matagne, Philippe | |
| dc.contributor.author | Chiarella, Thomas | |
| dc.contributor.author | Porret, Clément | |
| dc.contributor.author | Hikavyy, Andriy | |
| dc.contributor.author | Siew, Yong Kong | |
| dc.contributor.author | Goux, Ludovic | |
| dc.contributor.author | Mitard, Jerome | |
| dc.contributor.author | Horiguchi, Naoto | |
| dc.contributor.imecauthor | Eyben, Pierre | |
| dc.contributor.imecauthor | De Keersgieter, An | |
| dc.contributor.imecauthor | Matagne, Philippe | |
| dc.contributor.imecauthor | Chiarella, Thomas | |
| dc.contributor.imecauthor | Siew, Yong Kong | |
| dc.contributor.imecauthor | Goux, Ludovic | |
| dc.contributor.imecauthor | Mitard, Jerome | |
| dc.contributor.imecauthor | Horiguchi, Naoto | |
| dc.contributor.imecauthor | Porret, Clément | |
| dc.contributor.orcidimec | Eyben, Pierre::0000-0003-3686-556X | |
| dc.contributor.orcidimec | De Keersgieter, An::0000-0002-5527-8582 | |
| dc.contributor.orcidimec | Chiarella, Thomas::0000-0002-6155-9030 | |
| dc.contributor.orcidimec | Siew, Yong Kong::0009-0004-1634-4163 | |
| dc.contributor.orcidimec | Goux, Ludovic::0000-0002-1276-2278 | |
| dc.contributor.orcidimec | Mitard, Jerome::0000-0002-7422-079X | |
| dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
| dc.contributor.orcidimec | Matagne, Philippe::0000-0003-0365-2066 | |
| dc.contributor.orcidimec | Porret, Clément::0000-0002-4561-348X | |
| dc.date.accessioned | 2025-07-03T11:52:31Z | |
| dc.date.available | 2024-04-05T18:17:46Z | |
| dc.date.available | 2025-07-03T11:52:31Z | |
| dc.date.issued | 2024 | |
| dc.description.wosFundingText | The imec pilot line, the imec TEM team, and amsimec test labs are acknowledged for their support. | |
| dc.identifier.doi | 10.35848/1347-4065/ad2a9d | |
| dc.identifier.issn | 0021-4922 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/43781 | |
| dc.publisher | IOP Publishing Ltd | |
| dc.source.beginpage | Art. 04SP03 | |
| dc.source.endpage | N/A | |
| dc.source.issue | 4 | |
| dc.source.journal | JAPANESE JOURNAL OF APPLIED PHYSICS | |
| dc.source.numberofpages | 5 | |
| dc.source.volume | 63 | |
| dc.subject.keywords | GROWTH | |
| dc.title | Predictive and prospective calibrated TCAD to improve device performances in sub-20 nm gate length p-FinFETs | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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