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Hydrogen plasma treatment: the evolution of roughness in frequency domain

Date

2014
Proceedings Paper
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dc.contributor.authorDe Schepper, Peter
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorEl Otell, Ziad
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorDe Schepper, Peter
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorEl Otell, Ziad
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-22T01:09:04Z
dc.date.available2021-10-22T01:09:04Z
dc.date.embargo9999-12-31
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23722
dc.source.beginpage90540C
dc.source.conferenceAdvanced Etch Technology for Nanopatterning III
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.title

Hydrogen plasma treatment: the evolution of roughness in frequency domain

dc.typeProceedings paper
dspace.entity.typePublication
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