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Interplay between dry etch and wet clean in patterning La2O3/HfO2-containing high-k/metal gate stacks
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Interplay between dry etch and wet clean in patterning La2O3/HfO2-containing high-k/metal gate stacks
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Date
2009
Proceedings Paper
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19116.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vos, Ingrid
;
Hellin, David
;
Vrancken, Christa
;
Geypen, Jef
;
Bender, Hugo
;
Vecchio, Emma
;
Paraschiv, Vasile
;
Vertommen, Johan
;
Boullart, Werner
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2008
since deposited on 2021-10-18
Acq. date: 2025-12-15
Citations
Metrics
Views
2008
since deposited on 2021-10-18
Acq. date: 2025-12-15
Citations