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Process dependence on defectivity count on copper and dielectric surfaces in post-copper CMP cleaning
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Process dependence on defectivity count on copper and dielectric surfaces in post-copper CMP cleaning
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Date
2008
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17496.pdf
53.87 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Daviot, Jerome
;
Vaes, Jan
Journal
Abstract
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1892
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Acq. date: 2025-12-15
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Views
1892
since deposited on 2021-10-17
1
last month
Acq. date: 2025-12-15
Citations