Process dependence on defectivity count on copper and dielectric surfaces in post-copper CMP cleaning

dc.contributor.author	Daviot, Jerome
dc.contributor.author	Vaes, Jan
dc.date.accessioned	2021-10-17T06:42:25Z
dc.date.available	2021-10-17T06:42:25Z
dc.date.embargo	9999-12-31
dc.date.issued	2008
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/13590
dc.source.conference	9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSS
dc.source.conferencedate	22/09/2008
dc.source.conferencelocation	Brugge Belgium
dc.title	Process dependence on defectivity count on copper and dielectric surfaces in post-copper CMP cleaning
dc.type	Oral presentation
dspace.entity.type	Publication
Files	Original bundle Name: 17496.pdf Size: 53.87 KB Format: Adobe Portable Document Format Download
Publication available in collections:	Presentations

Date