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Articles
Progresses and challenges of EUV lithography materials
Publication:
Progresses and challenges of EUV lithography materials
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Date
2014
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30016.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
De Simone, Danilo
;
Goethals, Mieke
;
Van Roey, Frieda
;
Tao, Zheng
;
Foubert, Philippe
;
Hendrickx, Eric
;
Vandenberghe, Geert
;
Ronse, Kurt
Journal
Journal of Photopolymer Science and Technology
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1851
since deposited on 2021-10-22
Acq. date: 2025-12-16
Citations
Metrics
Views
1851
since deposited on 2021-10-22
Acq. date: 2025-12-16
Citations