Publication:

Progresses and challenges of EUV lithography materials

Date

2014
Journal article
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dc.contributor.authorDe Simone, Danilo
dc.contributor.authorGoethals, Mieke
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorTao, Zheng
dc.contributor.authorFoubert, Philippe
dc.contributor.authorHendrickx, Eric
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorRonse, Kurt
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorTao, Zheng
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-22T01:09:16Z
dc.date.available2021-10-22T01:09:16Z
dc.date.embargo9999-12-31
dc.date.issued2014
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23723
dc.identifier.urlhttps://www.jstage.jst.go.jp/article/photopolymer/27/5/27_601/_article
dc.source.beginpage601
dc.source.endpage610
dc.source.issue5
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.volume27
dc.title

Progresses and challenges of EUV lithography materials

dc.typeJournal article
dspace.entity.typePublication
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