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Backside Power Delivery With Relaxed Overlay for Backside Patterning Using Extreme Wafer Thinning and Molybdenum-Filled Slit Nano Through Silicon Vias
Publication:
Backside Power Delivery With Relaxed Overlay for Backside Patterning Using Extreme Wafer Thinning and Molybdenum-Filled Slit Nano Through Silicon Vias
Date
2024
Journal article
https://doi.org/10.1109/TED.2024.3487080
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Zhao, Peng
;
Witters, Liesbeth
;
Jourdain, Anne
;
Stucchi, Michele
;
Jourdan, Nicolas
;
Maes, J. W.
;
Bana, H.
;
Zhu, C.
;
Chukka, Rami
;
Sebaai, Farid
;
Vandersmissen, Kevin
;
Heylen, Nancy
;
Montero Alvarez, Daniel
;
Wang, S.
;
D'havé, Koen
;
Schleicher, F.
;
De Vos, Joeri
;
Beyer, Gerald
;
Miller, Andy
;
Beyne, Eric
Journal
IEEE TRANSACTIONS ON ELECTRON DEVICES
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115
since deposited on 2024-11-28
Acq. date: 2025-10-23
Citations
Metrics
Views
115
since deposited on 2024-11-28
Acq. date: 2025-10-23
Citations