Publication:
Single-wafer wet cleaning for a high particle removal efficiency on hydrophobic surface
Date
| dc.contributor.author | Sano, Ken-Ichi | |
| dc.contributor.author | Izumi, A. | |
| dc.contributor.author | Eitoku, Atsuro | |
| dc.contributor.author | Snow, Jim | |
| dc.contributor.author | Kesters, Els | |
| dc.contributor.author | Mertens, Paul | |
| dc.contributor.imecauthor | Kesters, Els | |
| dc.contributor.imecauthor | Mertens, Paul | |
| dc.date.accessioned | 2021-10-16T04:50:15Z | |
| dc.date.available | 2021-10-16T04:50:15Z | |
| dc.date.issued | 2005 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/11164 | |
| dc.source.beginpage | 134 | |
| dc.source.conference | Cleaning Technology in Semiconductor Device Manufacturing IX | |
| dc.source.conferencedate | 16/10/2005 | |
| dc.source.conferencelocation | Los Angeles, CA US | |
| dc.source.endpage | 141 | |
| dc.title | Single-wafer wet cleaning for a high particle removal efficiency on hydrophobic surface | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |